纳米压印系统 产品详情
纳米压印系统
ezimprinting introduces a bench-top, stand-alone nanoimprint platform.
this platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, uv-curing source, and alignment microscope.
it functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.
ezimprinting advantages
• sub-10nm resolution with 99% yield
• supports both hard and soft molds
• variable mold and substrate sizes offer unparalleled convenience and flexibility
• auto-release process prevents mold/substrate damage during separation and maximizes yield per imprint
• auto-release process prevents mold/substrate damage during separation and maximizes yield per imprint
• versatile processes for a wide variety of applications:
• optical devices, displays, data storage, biomedical
• devices, semiconductor ic's, chemical synthesis, and advanced materials
• programmable plc with touch-screen user interface allows process control through customized parameters
• proprietary uv-curable nanoimprint resist has no limitations on hardness or thickness, and is compatible with traditional photolithography processes